First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

(a) Unit optimization process with a hybrid continuous-discrete PSO algorithm. The particulars of the yellow and green boxes in the optimization are elaborated in (b) and (c), respectively. (b) The ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Diverging and converging patterns forming on the surface of solidifying liquid metals resemble plotlines in a complex historical novel, in a new international study. The cyclic patterns observed are ...